SCEN103 -- MOSFET Fabrication

[logo] MOSFET Fabrication

The following steps are representative of the process used for fabricating an n-channel MOSFET (metal-oxide-semiconductor field-effect transistor).

  1. Select p-type Silicon wafer
  2. Implant or diffuse two n-type regions, the 'source' and the 'drain'
  3. Add thin layer of SiO2 (an insulator)
  4. Add conducting layer which forms the gate
  5. Add ohmic contacts, the wires for connection to circuit
  6. Completed n-channel MOSFET

Back to SCEN103 Home Page.
Comments, suggestions, or requests to

Last updated Nov. 14, 1996.
Copyright George Watson, Univ. of Delaware, 1996.